Photolithography system

ABM double side mask aligner

- Resolution: 0.5μm
- Top side alignment accuracy: 1μm
- Backside visible alignment accuracy: 2μm
- Substrate: up to 6" wafer

Karl Suss MA4 mask aligner

- Resolution: 1μm
- IR backside alignment
- Substrate: up to 4" wafer





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Micro- and Nano-Fabrication Laboratory The Chinese University of Hong Kong