Micro- and Nano-Fabrication Laboratory is located at the ground floor annex of William MW Mong Engineering Building. It covers an area of over 300 square meters, having class 100, 1000 and 10,000 cleanroom areas.
The Laboratory has thin film and semiconductor processing equipment mainly for the fabrication of silicon based devices, although it also has capability for etching other materials such as III-V or metallic structures. Major equipment includes an inductively coupled plasma dry etching cluster (one chamber dedicated for silicon dry etching and another chamber for metal or III-V etching), a direct write electron beam lithography system, electron-beam evaporator, RF/DC magnetron sputtering system, LPCVD, PECVD. In addition, the facility is well equipped with supporting facilities such as wet stations, rapid thermal annealer, microscopes, Alpha-Step profilometer, a 4" Karl Suss contact mask aligner, and a 6" AMB double side contact mask aligner.
Currently the Laboratory supports advanced device research and development of sensors, MEMS, silicon photonic devices and micromechanical structures by users from Departments of Electronic Engineering, Mechanical and Automation Engineering, and Biomedical Engineering in Faculty of Engineering and also users from Faculty of Science. The Laboratory is primarily aimed at supporting academic research in Hong Kong.
Users from other institutions or local companies are welcome to use this facility subject to their accepting the terms and conditions of useage and the payment of fees as listed in the charging scheme.